2025”N

2024”NA2023”NA
2022”NA2021”NA2020”NA2019”NA
2018”NA2017”NA2016”NA2015”N

ŠwpŽGŽ˜_•Ά

I. D. Antro, T. Kawae
Environmentally Friendly Microfabrication of Oxide Thin Films with Minimal Residue Using Water Lift Off Process with Sacrificial a-CaO Layer
Accepted to Environmental Quality Management

Šw‰οEŒ€‹†‰ο•ρ

S. Taguchi, S. Hashimoto, C. Hong, T. Kawae
High-speed micropatterning of oxide thin films by water lift-off with high-pressure water jet
The 10th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO2025)iAOSSA, Fukuij

C. Hong, S. Taguchi, K. Nakamura, T. Mita, M. Nagao, T. Kawae
Micropatterning of YBa2Cu3O7-x thin film using high-pressure water jet treatment
The 10th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO2025)iAOSSA, Fukuij

K. Nakamura, T. Mita, K. Shimamura, M. Nagao, M. Kawahara, T. Kawae
Deposition of c-axis oriented YBa2Cu3O7-x thin film on Si substrates using self-oriented LaNiO3 film
The 10th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO2025)iAOSSA, Fukuij

R. Nakagawa, T. Saito, K. Sato, T. Matsumoto, N. Tokuda, T. Kawae
Diamond MOS structure with SiO2/Al2O3 bilayer gate insulator
The 10th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO2025)iAOSSA, Fukuij

μ] Œ’AŽO“c —CA’†‘Ί‹§—CA“‡‘Ίˆκ—˜A‰ΝŒ΄³”όA’·”φ‰λ‘₯
Ž©ŒΘ”zŒόLaNiO3‚π—˜—p‚΅‚½SiŠξ”γ‚ΜYBa2Cu3O7-x”––Œ¬’·
Superconductivity Interdisciplinary Seminar 2025 (SIS2025)iˆΙ“ŒŽsEŽRŠέ‰€j


’†μ—΄ˆκAΦ“‘‘Χ’nAΌ–{ —ƒA“Ώ“c‹K•vAμ] Œ’
SiO2/Al2O3‘½‘w–Œ‚π—p‚’‚½ƒ_ƒCƒ„ƒ‚ƒ“ƒhMOS\‘’‚ΜŒ`¬(2)
‘ζ72‰ρ‰ž—p•¨—Šw‰οt‹GŠwpu‰‰‰οi“Œ‹ž—‰Θ‘εE–μ“cƒLƒƒƒ“ƒpƒXj

ŽO“c —CA’†‘Ί‹§—CAŽO“c —SA“‡‘Ίˆκ—˜A‰ΝŒ΄³”όA’·”φ‰λ‘₯Aμ] Œ’
Ž©ŒΘ”zŒόLaNiO3‚π—˜—p‚΅‚½SiŠξ”γ‚Φ‚Μc޲”zŒόYBa2Cu3O7-x”––Œ‘͐ϐ΅‘w(2)

‘ζ72‰ρ‰ž—p•¨—Šw‰οt‹GŠwpu‰‰‰οi“Œ‹ž—‰Θ‘εE–μ“cƒLƒƒƒ“ƒpƒXj